Tokuyama Corp. announced that Hantok Chemicals—a Tokuyama–LOTTE joint venture—has broken ground on a new plant in Pyeongtaek, South Korea, to produce tetramethylammonium hydroxide (TMAH), a photoresist developer used in semiconductor manufacturing. Commercial operations are targeted for September 2027.
Tokuyama Corp. (Tokyo) announced that Hantok Chemicals Co., Ltd. , an equity-method affiliate of Tokuyama, held a groundbreaking ceremony in Pyeongtaek, Republic of Korea, for its new Pyeongtaek Plant, which will be a production facility for tetramethylammonium hydroxide (TMAH), a photoresist developer. Commercial operations are scheduled to commence in September 2027. Hantok is a joint […]
The post Tokuyama-LOTTE JV breaks ground on new tetramethylammonium hydroxide plant appeared first on Chemical Engineering.
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